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Heat treatment system
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| Due to our original know-how, we have realized the stable temperature control which is essential for Heat treatment.
The Heat treatment system for the wide-gap semiconductor (GaN etc.) which is being the focus of recent attention has been in a great demand.
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| OS-5500 Series (High-temperature type) |
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Suitable for Ohmic electrode alloy and anneal
for wide-gap semiconductor (GaN, SiC, et.)
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| OS-3500 Series (Low-temperature type) |
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Suitable for Ohmic electrode alloy and anneal
for the compound semiconductor for general purpose (GaAs
system and InP system)
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Batch-processing wafer annealing system |
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| CA-5200 |
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The multipurpose
batch-processing wafer annealing system specialized in the
compound semiconductor.
The substrate is compatible of the temperature up to 700 degree
and mountable up to 5 3-inch substrates.
In addition, it is equipped with the transfer mechanism of
treatment room so that the processes from heating to cooling
can be done with the room being closed.
The vacuum replacement mechanism is also provided for the
use of diffusion of solid phase. |
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Vertical-type diffusion system |
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| OD-2500 |
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Since the closed
pipe method is used for the zinc diffusion process that used
to be done in the closed pipe, the safety and maneuverability
has considerably improved while keeping the performance equivalent
to that of the closed pipe method.
It is compatible to φ2 inch or φ3 inch wafer
Also, the double trap structure can connect the inboard disposal
to the general disposal. |
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