We will discuss and take order for the development and trial production of a special specification system required for the R&D and various equipments for R&D.
Small-size high-voltage generating system
HVP-6000
The output can be switched ON/OFF individually
and the voltage can be visually observed on monitor. This
can be used for the mass spectroscope and bio relation.
Multifunctional etching ashing
system
PP-6000
It is a multipurpose etching
system developed by targeting from experiment to the jobbing
production. The installation space (excluding the attached
equipment) for the size of only one desk is enough to handle
from the chemical etching to the plasma etching.
(Source of consignment development: Mitsui Electronics Inc.)
Back-side etching system
PABE-303
The dry etching is done at the back side
of Si wafer by using gas activated in high-frequency plasma.
(Source of consignment development: Tokyo Electron Limited)
Atmospheric-pressure plasma system for MEMS
KAP-1000
The formation of insulation membrane at low temperature and high speed is available by using the source of original Atmospheric-pressure and high-density plasma.
(Source of joint development: Sekisui Chemical Co., Ltd.)
